Journal article
Canadian Journal of Physics, vol. 65, 1987, pp. 1030-1032
APA
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Waechter, D., & Tarr, N. G. (1987). Low-temperature crystallization of in situ phosphorus-doped low-pressure chemical-vapour deposited amorphous silicon. Canadian Journal of Physics, 65, 1030–1032.
Chicago/Turabian
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Waechter, David, and N G Tarr. “Low-Temperature Crystallization of in Situ Phosphorus-Doped Low-Pressure Chemical-Vapour Deposited Amorphous Silicon.” Canadian Journal of Physics 65 (1987): 1030–1032.
MLA
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Waechter, David, and N. G. Tarr. “Low-Temperature Crystallization of in Situ Phosphorus-Doped Low-Pressure Chemical-Vapour Deposited Amorphous Silicon.” Canadian Journal of Physics, vol. 65, 1987, pp. 1030–32.
BibTeX Click to copy
@article{waechter1987a,
title = {Low-temperature crystallization of in situ phosphorus-doped low-pressure chemical-vapour deposited amorphous silicon},
year = {1987},
journal = {Canadian Journal of Physics},
pages = {1030-1032},
volume = {65},
author = {Waechter, David and Tarr, N G}
}